We report on the elaboration of nickel thin films, isolated clusters and nanowires on silicon, glass and polymers by a low temperature deposition technique. The process is based on the thermal decomposition of Ni (C8H12)2 at temperature as low as 80°C, which yields exclusively metallic Ni. The low temperature of the process makes it compatible with most of the substrates, even polymers and organic layers. The nanowires form a network of parallel lines on silicon.
M. Shviro and D. Zitoun Nanoscale 2012, 4, 762-767